Current stability and position stability are top-class in the industry! Electron beam lithography equipment.
Achieved a minimum beam diameter of 2nm at an acceleration voltage of 50kV! *Drawing demo available.
This is a model suitable for the production of DFB-LDs (Distributed Feedback Laser Diodes) for communication use. It is a flagship product that adopts a 50kV acceleration voltage, balancing fine processing capability and resist sensitivity. 【Features】 ■ TFE electron gun using single crystal ZrO/W ■ Outstanding beam current stability and beam position stability ■ Achieves a minimum beam diameter of 2nm at an acceleration voltage of 50kV *Drawing demonstrations are available. For more details, please contact us or download the PDF for more information.
- Company：クレステック 本社
- Price：Other
